Recently, the stock prices of semiconductor companies such as Samsung Electronics and SK Hynix have been steadily rising in ...

Researchers led by a group from John Hopkins University have knocked down one of at least three major barriers to using ...

Hafnium oxide (HfO2) is a promising material for advanced semiconductors, but it is also known for its challenging etching properties. A group of researchers from Japan and Taiwan has successfully ...

The “beyond extreme ultraviolet radiation” (B-EUV) process uses stronger radiation than traditional EUV, but doesn’t interact ...

Hafnium oxide (HfO2) has attracted attention as a promising material for ultrathin semiconductors and other microelectronic ...

Stacking glass for high-frequency applications Glass is ideal for 6G wireless communication networks, which must support >100 ...

Scientists successfully etched this hard-to-etch material at room temperature without using halogen gases for the first time.

About the Ultra ECDP Tool The Ultra ECDP tool is compatible with 6-inch and 8-inch platforms and accommodates 150 millimeter (mm), 159mm and 200mm wafer sizes. The system is configurable with two open ...

With the recent release of BirdSmart Bird Safe Glass by Vitro Architectural Glass, Vitro has released a white paper entitled, ...

The technique avoids toxic byproducts from conventional halogen gases, cutting environmental impact while advancing ...

Hafnium oxide (HfO2) has attracted attention as a promising material for ultrathin semiconductors and other microelectronic devices. The strong ionic ...

The process allows circuits to be written on silicon wafers using a method that relies on radiation-triggered reactions ...