Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

Share and share alike! Our mothers always said it was the right thing to do, and it seems that this ideology is now coming front and center for double patterning at 20nm and below. As we continue to ...

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

Double patterning looks like being the lithography tool of choice at 32nm, but how do you absorb the inevitable extra costs of a double lithography process? According to Applied Materials, the world’s ...

SAN FRANCISCO — Amid probable delays for extreme ultraviolet (EUV) lithography, ASML, Canon and Nikon are updating their roadmaps, racing each other to capitalize on the shift towards ...

Researchers, equipment vendors, and manufacturers alike are watching with growing concern as we creep every closer to the end of 193 nm optical lithography. The problem is not that there are no ...

The new tool enables users for the first time to evaluate current double-patterning schemes and cost-effectively explore alternate solutions to lithography challenges in design, materials and process ...

LEUVEN, BELGIUM: IMEC, in collaboration with JSR Corp. realized a simplified process using only one etch step to reduce the cost of double patterning. 32nm lines and spaces were printed with a double ...

Sematech and the Semiconductor Metrology Systems (SMS) division of Carl Zeiss claim to have reached a key development milestone in the development of a next generation photomask registration and ...

Water remains the best liquid for immersion lithography is the conclusion of the recent SPIE Advanced Lithography conference in San Jose. Despite a massive search for a liquid with a higher refractive ...

As the optical lithography advances into the sub-30nm technology node, the various candidates of lithography have been discussed. Double dipole lithography (DDL) has been a primary lithography ...