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Fremont, CA (Marketwired). Lam Research Corp. has announced that it is expanding its atomic layer etching (ALE) portfolio with the addition of ALE capability on its Flex dielectric etch systems.
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Halogen-free plasma technique achieves atomic-level etching of hafnium oxide for next-gen semiconductors
Hafnium oxide (HfO2) has attracted attention as a promising material for ultrathin semiconductors and other microelectronic ...
BREA, Calif., April 25, 2025 /PRNewswire/ -- Ormcoâ„¢ Corporation, a global leader in orthodontic solutions for over 60 years, is thrilled to announce the modernization of the commonplace adhesive and ...
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